Faculty Publications
Measurement of the Clustering Energy of Manganese Silicide Islands on Si(001) by Ostwald Ripening
Document Type
Article
Journal/Book/Conference Title
Applied Physics Letters
Volume
91
Issue
4
Abstract
The rate of growth during annealing of manganese silicide islands in the submonolayer coverage regime on the Si(001) surface has been measured by scanning tunneling microscopy. The fourth power of the growth rate is linearly dependent upon the annealing time, consistent with a diffusion limited Ostwald ripening mechanism for island growth. The growth rate has been determined for four different annealing temperatures to extract the activation energy for clustering, which has been found to be 2.6±0.2 eV. © 2007 American Institute of Physics.
Department
Department of Physics
Original Publication Date
8-3-2007
DOI of published version
10.1063/1.2766681
Recommended Citation
Stollenwerk, Andrew J.; Krause, M. R.; Licurse, M.; and LaBella, V. P., "Measurement of the Clustering Energy of Manganese Silicide Islands on Si(001) by Ostwald Ripening" (2007). Faculty Publications. 6057.
https://scholarworks.uni.edu/facpub/6057