Faculty Publications
Document Type
Article
Publication Version
Published Version
Journal/Book/Conference Title
AIP Advances
Volume
12
Issue
3
Abstract
The magnetoresistance of thin nickel films grown on molybdenum disulfide was measured in perpendicular magnetic fields as high as 90 kOe. Films with thicknesses of 20 nm provided continuous surfaces for measurement. The magnetoresistance was found to be linear with respect to the applied magnetic field with no sign of saturation. There was also no evidence of hysteresis or temperature dependence between 100 to 300 K. STM measurement showed the deposited Ni forms a continuous film of extremely small nanoclusters. However, the field dependence of magnetoresistance was found to be significantly larger than bulk Ni, which is in turn larger than Ni with nanoscale grains. We expect the unusual magnetoresistance behavior to arise from some property of the Ni-MoS2 interface.
Department
Department of Physics
Original Publication Date
3-1-2022
Object Description
1 PDF file
DOI of published version
10.1063/9.0000291
Repository
UNI ScholarWorks, Rod Library, University of Northern Iowa
Copyright
©2022 The Authors. Creative Commons Attribution License.
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 International License.
Language
en
File Format
application/pdf
Recommended Citation
Kidd, Timothy E.; Shand, Paul M.; Stollenwerk, Andrew; Gorgen, Colin; Moua, Young; Stuelke, Lukas; and Lukashev, Pavel V., "Large-Field Magnetoresistance Of Nanometer Scale Nickel Films Grown On Molybdenum Disulfide" (2022). Faculty Publications. 5230.
https://scholarworks.uni.edu/facpub/5230
