Faculty Publications

Title

Thermal stability of hydrocarbon monolayers on porous silicon

Document Type

Conference

Journal/Book/Conference Title

ACS National Meeting Book of Abstracts

Abstract

Porous silicon was used as a representative model for monolayers on MEMS. Two methods were employed for the production of porous silicon, stain etching and anodic etching. The attachment of octane, dodecane, and octadecane monolayers was done by two methods, the reflux method and the ethyl aluminum dichloride catalyst method. Ultimately the thermal degradation of these different monolayers was studied. Using TGA and analysis of FT-IR it was determined that all of the aforementioned monolayers had initial desorption/degradation from 300°C to 350°C, with all monolayers being desorbed by 400°C.

Original Publication Date

12-1-2008

This document is currently not available here.

Share

COinS