Thermal Stability Of Hydrocarbon Monolayers On Porous Silicon
ACS National Meeting Book of Abstracts
Porous silicon was used as a representative model for monolayers on MEMS. Two methods were employed for the production of porous silicon, stain etching and anodic etching. The attachment of octane, dodecane, and octadecane monolayers was done by two methods, the reflux method and the ethyl aluminum dichloride catalyst method. Ultimately the thermal degradation of these different monolayers was studied. Using TGA and analysis of FT-IR it was determined that all of the aforementioned monolayers had initial desorption/degradation from 300°C to 350°C, with all monolayers being desorbed by 400°C.
Department of Chemistry and Biochemistry
Original Publication Date
Simonson, Andrew N.; Cunningham, Robert S.; and Coon, Shoshanna R., "Thermal Stability Of Hydrocarbon Monolayers On Porous Silicon" (2008). Faculty Publications. 2342.