Hall Effect in Thin Silver Films

Authors

J. C. Steinberg, State University of IowaFollow

Document Type

Research

Abstract

The Hall Effect as a function of thickness has been investigated in chemically deposited films of silver, of thickness ranging from 40 to 200 millimicrons, and the Hall Coefficient found to be independent of both magnetic field, for fields up to 20000 Gauss, and thickness. The specific resistance of the same films increases as much as 200 per cent for some of the thinner films. These results are in good agreement with those obtained by Dr. G. R. Wait last year.

Publication Date

1921

Journal Title

Proceedings of the Iowa Academy of Science

Volume

28

Issue

1

First Page

115

Last Page

115

Copyright

©1921 Iowa Academy of Science, Inc.

Language

en

File Format

application/pdf

Recommended Citation

Steinberg, J. C. (1921) "Hall Effect in Thin Silver Films," Proceedings of the Iowa Academy of Science, 28(1), 115-115.
Available at: https://scholarworks.uni.edu/pias/vol28/iss1/23