The Hall Effect as a function of thickness has been investigated in chemically deposited films of silver, of thickness ranging from 40 to 200 millimicrons, and the Hall Coefficient found to be independent of both magnetic field, for fields up to 20000 Gauss, and thickness. The specific resistance of the same films increases as much as 200 per cent for some of the thinner films. These results are in good agreement with those obtained by Dr. G. R. Wait last year.
Proceedings of the Iowa Academy of Science
©1921 Iowa Academy of Science, Inc.
Steinberg, J. C.
"Hall Effect in Thin Silver Films,"
Proceedings of the Iowa Academy of Science, 28(1), 115-115.
Available at: https://scholarworks.uni.edu/pias/vol28/iss1/23