Faculty Publications

Title

Next-generation CVD aluminum precursors pose new handling challenges

Document Type

Article

Journal/Book/Conference Title

Solid State Technology

Volume

40

Issue

6

First Page

193

Last Page

200

Abstract

Among newer materials explored for advanced CVD processes are aluminum compounds in place of more traditional precursors such as tungsten hexafluoride (WF 6). New processing materials can bring with them new processing challenges (and often handling and safety issues as well). While WFe reacts with air and water to form poisonous compounds like HF, aluminum precursors tend to be pyrophoric and ignite upon reaction with air and water. With knowledge of their physical and chemical properties, and proper handling, these new aluminum precursors can be safely incorporated into CVD processes.

Original Publication Date

6-1-1997

This document is currently not available here.

Share

COinS